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Topic

Sputtering target Steady

995 applications whose title mentions it. Its share of new filings over the last two years is -20% below the four years before.

Allowance rate
63%
−12 pts vs the USPTO 953 decided
Months to first action
20.6 mo
+2.0 vs the USPTO
Applications
995.0
in the record
Allowed
604.0
349 abandoned

Filings by year

How often the topic was filed

The most recent years are still filling in.

Applications

Recent applications on this topic

ApplicationTitleFiledStatusRejectionsRCEsTo 1st action
19625334SPUTTERING TARGET, METHOD FOR MANUFACTURING THE SAME, AND FILM2026-09-17Pending00n/a
19620295AG-BASED ALLOY SPUTTERING TARGET FOR SPUTTERING OF LAYERS WITH IMPROVED REFLECTIVITY2026-09-01Pending00n/a
19620289AG ALLOY SPUTTERING TARGET WITH HIGH HOMOGENEITY2026-09-01Pending00n/a
15570365Method and apparatus for adaptive signal processing2012-01-10Allowed1012.0 mo
15338237Composition and method for controlled release2015-02-11Abandoned4123.0 mo
15841077Distributed ledger transaction verification2018-03-12Allowed3020.0 mo
15849443Thermal management of battery assemblies2021-04-13Pending2117.0 mo
15616678Machine learning model for anomaly detection2012-05-14Allowed1014.0 mo
15685066Wireless power transfer coil arrangement2015-06-15Abandoned4125.0 mo
15913320Catalyst for selective hydrogenation2018-07-16Allowed3022.0 mo
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