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Topic

Extreme ultraviolet lithography Steady

202 applications whose title mentions it. Its share of new filings over the last two years is -21% below the four years before.

Allowance rate
94%
+19 pts vs the USPTO 175 decided
Months to first action
17.3 mo
−1.3 vs the USPTO
Applications
202.0
in the record
Allowed
165.0
10 abandoned

Filings by year

How often the topic was filed

The most recent years are still filling in.

Applications

Recent applications on this topic

ApplicationTitleFiledStatusRejectionsRCEsTo 1st action
19669970EXTREME ULTRAVIOLET (EUV) RADIATION SOURCE APPARATUS, EUV LITHOGRAPHY SYSTEM, AND M…2026-05-06Pending00n/a
19657185PHOTORESIST, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND METHOD OF EXTREME U…2026-04-24Pending00n/a
19574135COMPOUNDS AND PROCESSES FOR EXTREME ULTRAVIOLET LITHOGRAPHY2026-03-20Pending00n/a
15745796Method and apparatus for adaptive signal processing2012-01-10Allowed1012.0 mo
15456099Composition and method for controlled release2015-02-11Abandoned4123.0 mo
15693485Distributed ledger transaction verification2018-03-12Allowed3020.0 mo
15884512Thermal management of battery assemblies2021-04-13Pending2117.0 mo
15864908Machine learning model for anomaly detection2012-05-14Allowed1014.0 mo
15619476Wireless power transfer coil arrangement2015-06-15Abandoned4125.0 mo
15922861Catalyst for selective hydrogenation2018-07-16Allowed3022.0 mo
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