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Topic

Plasma etching Steady

529 applications whose title mentions it. Its share of new filings over the last two years is -4% below the four years before.

Allowance rate
72%
−4 pts vs the USPTO 476 decided
Months to first action
19.0 mo
+0.4 vs the USPTO
Applications
529.0
in the record
Allowed
342.0
134 abandoned

Filings by year

How often the topic was filed

The most recent years are still filling in.

Applications

Recent applications on this topic

ApplicationTitleFiledStatusRejectionsRCEsTo 1st action
19623231PLASMA ETCHING METHOD2026-09-11Pending00n/a
19621927ETCHING GAS COMPOSITION INCLUDING HEPTAFLUOROISOPROPYL TRIFLUOROMETHYL KETONE AND P…2026-09-07Pending00n/a
19621926ETCHING GAS COMPOSITION COMPRISING HEXAFLUOROBENZENE AND PLASMA ETCHING METHOD USIN…2026-09-07Pending00n/a
15542450Method and apparatus for adaptive signal processing2012-01-10Allowed1012.0 mo
15864713Composition and method for controlled release2015-02-11Abandoned4123.0 mo
15122308Distributed ledger transaction verification2018-03-12Allowed3020.0 mo
15533956Thermal management of battery assemblies2021-04-13Pending2117.0 mo
15971122Machine learning model for anomaly detection2012-05-14Allowed1014.0 mo
15975601Wireless power transfer coil arrangement2015-06-15Abandoned4125.0 mo
15509646Catalyst for selective hydrogenation2018-07-16Allowed3022.0 mo
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