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Topic

Euv lithography Steady

369 applications whose title mentions it. Its share of new filings over the last two years is 17% above the four years before.

Allowance rate
89%
+14 pts vs the USPTO 312 decided
Months to first action
17.3 mo
−1.3 vs the USPTO
Applications
369.0
in the record
Allowed
278.0
34 abandoned

Filings by year

How often the topic was filed

The most recent years are still filling in.

Applications

Recent applications on this topic

ApplicationTitleFiledStatusRejectionsRCEsTo 1st action
19880982GLASS SUBSTRATE FOR EUV LITHOGRAPHY AND MASK BLANK FOR EUV LITHOGRAPHY2026-09-30Pending00n/a
19697052SYSTEM AND METHOD FOR INSPECTING A MASK FOR EUV LITHOGRAPHY2026-06-03Pending00n/a
19585056DIFFUSION BARRIERS TO REDUCE QUEUE-TIME EFFECTS IN EUV LITHOGRAPHY2026-05-06Pending00n/a
15636214Method and apparatus for adaptive signal processing2012-01-10Allowed1012.0 mo
15646302Composition and method for controlled release2015-02-11Abandoned4123.0 mo
15696129Distributed ledger transaction verification2018-03-12Allowed3020.0 mo
15904769Thermal management of battery assemblies2021-04-13Pending2117.0 mo
15126249Machine learning model for anomaly detection2012-05-14Allowed1014.0 mo
15823798Wireless power transfer coil arrangement2015-06-15Abandoned4125.0 mo
15446473Catalyst for selective hydrogenation2018-07-16Allowed3022.0 mo
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