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Topic

Resist patterning Steady

449 applications whose title mentions it. Its share of new filings over the last two years is -21% below the four years before.

Allowance rate
91%
+16 pts vs the USPTO 401 decided
Months to first action
17.8 mo
−0.8 vs the USPTO
Applications
449.0
in the record
Allowed
365.0
36 abandoned

Filings by year

How often the topic was filed

The most recent years are still filling in.

Applications

Recent applications on this topic

ApplicationTitleFiledStatusRejectionsRCEsTo 1st action
17111909ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS2020-12-04Abandoned5220.6 mo
17108223ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS2020-12-01Allowed7319.8 mo
17097921Methods for Extreme Ultraviolet (EUV) Resist Patterning Development2020-11-13Allowed004.6 mo
15589595Method and apparatus for adaptive signal processing2012-01-10Allowed1012.0 mo
15915013Composition and method for controlled release2015-02-11Abandoned4123.0 mo
15199653Distributed ledger transaction verification2018-03-12Allowed3020.0 mo
15769843Thermal management of battery assemblies2021-04-13Pending2117.0 mo
15652337Machine learning model for anomaly detection2012-05-14Allowed1014.0 mo
15252659Wireless power transfer coil arrangement2015-06-15Abandoned4125.0 mo
15442766Catalyst for selective hydrogenation2018-07-16Allowed3022.0 mo
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