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Topic

Inductively coupled plasma Steady

241 applications whose title mentions it. Its share of new filings over the last two years is 12% above the four years before.

Allowance rate
75%
level with the USPTO 213 decided
Months to first action
21.6 mo
+3.0 vs the USPTO
Applications
241.0
in the record
Allowed
160.0
53 abandoned

Filings by year

How often the topic was filed

The most recent years are still filling in.

Applications

Recent applications on this topic

ApplicationTitleFiledStatusRejectionsRCEsTo 1st action
19616180Inductively-Coupled Plasma (ICP) Source for Rectangular Substrate2026-08-18Pending00n/a
19591906LIQUID COOLED CERAMIC WINDOW FOR INDUCTIVELY COUPLED PLASMA PROCESSING SYSTEMS2026-05-29Pending00n/a
19679850ANTENNA FOR INDUCTIVELY COUPLED PLASMA EXCITATION, ANTENNA UNIT FOR INDUCTIVELY COU…2026-05-18Pending00n/a
15351266Method and apparatus for adaptive signal processing2012-01-10Allowed1012.0 mo
15918913Composition and method for controlled release2015-02-11Abandoned4123.0 mo
15380466Distributed ledger transaction verification2018-03-12Allowed3020.0 mo
15165825Thermal management of battery assemblies2021-04-13Pending2117.0 mo
15830325Machine learning model for anomaly detection2012-05-14Allowed1014.0 mo
15272283Wireless power transfer coil arrangement2015-06-15Abandoned4125.0 mo
15960101Catalyst for selective hydrogenation2018-07-16Allowed3022.0 mo
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